Specific Process Knowledge/Thermal Process/Annealing: Difference between revisions

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 ==Annealing==
-At Danchip we have six furnaces for annealing: A1,A3,C1,C2,C3 and C4. Annealing can take place either by a dry process or a wet process. In a wet annealing you will also get some oxidation.
+At Danchip we have seven furnaces and an RTP for annealing: A1,A3,C1,C2,C3,C4 noble furnace and RTP. Annealing can take place either by a dry process or a wet process. In a wet annealing you will also get some oxidation.
-*Dry anneal is used for ? and can be done in furnaces:A1,A3,C1,C2,C3,C4.
+*Dry anneal is used for ? and can be done in furnaces:A1,A3,C1,C2,C3,C4, noble furnace and RTP
 *Wet anneal with H2O in a bubbler is used for ? and can be done in furnaces:C1,C2,C3.