Specific Process Knowledge/Lithography/ZEP520A: Difference between revisions
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|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
|Spin Coater Manual, LabSpin, A-5 | |Spin Coater Manual, LabSpin, A-5 | ||
|ZEP520A 1:1 E-beam resist | |ZEP520A 1:1 or ZEP520A 1:2 E-beam resist | ||
60 sec at various spin speed. | 60 sec at various spin speed. | ||
Acceleration 4000 s-2, | Acceleration 4000 s-2, | ||
softbake 2 min at 180 deg Celcius | softbake 2 min at 180 deg Celcius | ||
|Resist poured directly from bottle or | |Resist poured directly from bottle or disposable pipette | ||
|TIGRE, 23-04-2014 | |TIGRE, 23-04-2014 and 21-05-2014 | ||
|- | |- | ||
| Line 57: | Line 57: | ||
|9 points measured on 100 mm wafer | |9 points measured on 100 mm wafer | ||
|ZEP program used; measured at 70 deg only | |ZEP program used; measured at 70 deg only | ||
|TIGRE, 23-04-2014 | |TIGRE, 23-04-2014 and 21-05-2014 | ||
|- | |- | ||
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dose 120-280 muC/cm2 | dose 120-280 muC/cm2 | ||
|Virtual chip mark height detection | |Virtual chip mark height detection | ||
| TIGRE | | TIGRE | ||
|- | |- | ||
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|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
|Fumehood, D-3 | |Fumehood, D-3 | ||
|60 sec in , | |60 sec in N50, | ||
60 sec rinse in IPA, | 60 sec rinse in IPA, | ||
N2 Blow dry | N2 Blow dry | ||
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== Spin Curves == | == Spin Curves == | ||