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Specific Process Knowledge/Etch/Wet III-V Etches: Difference between revisions

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Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
1,146 edits
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Concentrated H<sub>2</sub>SO<sub>4</sub>(96%) is a selective etch of InP with a very low etch rate in InGaAsP.
Concentrated H<sub>2</sub>SO<sub>4</sub>(96%) is a selective etch of InP with a very low etch rate in InGaAsP.


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