Specific Process Knowledge/Etch/Wet III-V Etches: Difference between revisions
| Line 114: | Line 114: | ||
BHF etches SiO<sub>2</sub> and removes native oxide on InGaAs. '''Do not use BHF unless you know the dangers involved with this chemical and always use 4H gloves!'''. | BHF etches SiO<sub>2</sub> and removes native oxide on InGaAs. '''Do not use BHF unless you know the dangers involved with this chemical and always use 4H gloves!'''. | ||
{| border="1" style="text-align: center; width: 500px; height: 100px;" | {| border="1" style="text-align: center; width: 500px; height: 100px;" | ||