Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions
| Line 18: | Line 18: | ||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=106 PECVD3 in LabManager] | [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=106 PECVD3 in LabManager] | ||
== Process information on PECVD2 | == Process information on PECVD2 and PECVD3== | ||
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD|Recipes for deposition of silicon oxides]] | *[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD|Recipes for deposition of silicon oxides]] | ||
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD#Recipes on PECVD3 for deposition of silicon nitride and silicon oxynitride|Recipes on for deposition of silicon nitride and silicon oxynitride]] | *[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD#Recipes on PECVD3 for deposition of silicon nitride and silicon oxynitride|Recipes on for deposition of silicon nitride and silicon oxynitride]] | ||