Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions
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== Process information on PECVD2, PECVD3 (and PECVD1:<span style="color:Red">Expired!</span>)== | == Process information on PECVD2, PECVD3 (and PECVD1:<span style="color:Red">Expired!</span>)== | ||
*Recipes for PECVD2 are in the III-V entry in LAbAdviser, see [[Specific Process Knowledge/III-V Process/thin film dep/pecvd2| here]] | *Recipes for PECVD2 are in the III-V entry in LAbAdviser, see [[Specific Process Knowledge/III-V Process/thin film dep/pecvd2| here]] | ||
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD|Recipes | *[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD|Recipes for deposition of silicon oxides]] | ||
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD#Recipes on PECVD3 for deposition of silicon nitride and silicon oxynitride|Recipes on | *[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD#Recipes on PECVD3 for deposition of silicon nitride and silicon oxynitride|Recipes on for deposition of silicon nitride and silicon oxynitride]] | ||
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