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Specific Process Knowledge/Characterization/Sample imaging: Difference between revisions

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* Much better resolution: Down to a few nanometers.
* Much better resolution: Down to a few nanometers.
* Much higher magnifications possible: Up to 500.000 times on some samples.
* Much higher magnifications possible: Up to 500.000 times on some samples.
*
* Quantification: As a metrology instrument the SEM is absolutely necessary.
* The stage: It allows you to image your sample from almost any angle.  
* The stage: It allows you to image your sample from almost any angle.  
* Tunability: One can tune the image in a number of ways in order to enhance topography or material contrast.
* Tunability: One can tune the image in a number of ways in order to enhance topography or material contrast.
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* Sample preparation and mounting: You may have to prep your sample in several ways, either coating, cleaving or mounting on specific sample holders.
* Sample preparation and mounting: You may have to prep your sample in several ways, either coating, cleaving or mounting on specific sample holders.


The image that one gets from a SEM 
=== The atomic force microscope ===


{| border="1" cellspacing="0" cellpadding="6"
The [[Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy|atomic force microscope]] has only little use as a sample imaging instrument.
!
!Optical microscopes
!SEM
!AFM  
|-
| Magnification range
|25x to 1000x
|100x to 500.000x
|Maximum scanned area 90x90 µm
|-
|Depth of focus
|Low
|Very high
|
|}
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