Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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!colspan="4"|Spin Coat | !colspan="4"|Pretreatment | ||
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|-style="background:WhiteSmoke; color:black" | |||
|Si wafers | |||
|No Pretreatment | |||
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|TIGRE, 08-04-2014 | |||
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|-style="background:WhiteSmoke; color:black; text-align:center" | |||
!colspan="4"|Spin Coat | |||
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|Spin Coater Manual, LabSpin, A-5 | |Spin Coater Manual, LabSpin, A-5 | ||
|60 sec at various spin speed. | |AR-P 6200/2 AllResist E-beam resist | ||
60 sec at various spin speed. | |||
Acceleration 4000 s-2, | Acceleration 4000 s-2, | ||
softbake 5 min at 150 deg Celcius | softbake 5 min at 150 deg Celcius | ||