Specific Process Knowledge/Lithography: Difference between revisions
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*E-beam sensitive | *E-beam sensitive | ||
** | **ZEP502A, [[/CSAR|CSAR]] , PMMA (positive) | ||
**HSQ, Ma-N 2403, AR-N 7520 (negative) | **HSQ, Ma-N 2403, AR-N 7520 (negative) | ||
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