Specific Process Knowledge/Characterization/Sample imaging: Difference between revisions

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=== What kind of instrument to use ===
=== What kind of instrument to use ===


There is a lot of optical microscope scattered around in the cleanroom because they are in great need. They are useful if, for instance, you need to
There is a lot of optical microscopes scattered around in the cleanroom because they are in great need. They are useful if, for instance, you need to
* inspect the quality of UV exposed photoresist when doing photolithography,  
* inspect the quality of UV exposed photoresist when doing photolithography,  
* check for particles on wafers that have been processed in the furnaces or the PECVD's,
* check for particles on wafers that have been processed in the furnaces or the PECVD's,
* check the quality of KOH etched structures or  
* check the quality of KOH etched structures or  
* generally verify any in batch process
* generally verify any in batch process.
Using the different options such as bright/dark field, polarizer or transmitted/reflected light one can find a better signal for a specific need.
Using the different options such as bright/dark field, polarizer or transmitted/reflected light one can find a better signal for a specific need. Some of them have a camera that allows you to capture and store images.
 
One of the advantages of the optical microscopes is that they provide fast and easy accessible information about any sample without any kind of sample preparation. They do, however, also have some limitations.
 





Revision as of 11:35, 24 January 2008

The list of instruments for sample imaging available at Danchip includes 6 optical microscopes , three scanning electron microscopes (SEM's) and an atomic force microscope (AFM). These instruments cover a wide range of applications.

What kind of instrument to use

There is a lot of optical microscopes scattered around in the cleanroom because they are in great need. They are useful if, for instance, you need to

  • inspect the quality of UV exposed photoresist when doing photolithography,
  • check for particles on wafers that have been processed in the furnaces or the PECVD's,
  • check the quality of KOH etched structures or
  • generally verify any in batch process.

Using the different options such as bright/dark field, polarizer or transmitted/reflected light one can find a better signal for a specific need. Some of them have a camera that allows you to capture and store images.

One of the advantages of the optical microscopes is that they provide fast and easy accessible information about any sample without any kind of sample preparation. They do, however, also have some limitations.


Optical microscopes SEM AFM
Magnification range 25x to 1000x 100x to 500.000x Maximum scanned area 90x90 µm
Depth of focus Low Very high