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Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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|[[media:Process_Flow_ZEP.docx|Process_Flow_ZEP.docx]], [[media:Process_Flow_ZEP_with_Al.docx‎|Process_Flow_ZEP_with_Al.docx‎]]
|[[media:Process_Flow_ZEP.docx|Process_Flow_ZEP.docx]], [[media:Process_Flow_ZEP_with_Al.docx‎|Process_Flow_ZEP_with_Al.docx‎]]


|-
|-style="background:LightGrey; color:black"
|'''CSAR'''
|Positive
|AllResist
|Approved, not tested yet. Should work similar to ZEP520A. Please contact [mailto:Lithography@danchip.dtu.dk Lithography] for information.
|[[media:CSAR_62_and_process_chemicals.pdf‎|CSAR_62_and_process_chemicals.pdf‎]], [[media:CSAR_62_Abstract_Allresist.pdf‎|CSAR_62_Abstract_Allresist.pdf‎]]
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]]
|X AR 600-54/6, MIBK:IPA
|IPA, H2O
|
|[[media:Process_Flow_CSAR.docx‎|Process_Flow_CSAR.docx‎]]


|-
|-
|-style="background:LightGrey; color:black"
|-style="background:WhiteSmoke; color:black"
|'''ZEP7000'''
|'''ZEP7000'''
|Positive
|Positive
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|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:LightGrey; color:black"
|'''PMMA'''
|'''PMMA'''
|Positive
|Positive
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|acetone/1165
|acetone/1165
|Trilayer stack: [[media:Process_Flow_Trilayer_Ebeam_Resist.docx‎|Process_Flow_Trilayer_Ebeam_Resist.docx‎]]
|Trilayer stack: [[media:Process_Flow_Trilayer_Ebeam_Resist.docx‎|Process_Flow_Trilayer_Ebeam_Resist.docx‎]]




|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
|'''CSAR'''
|Positive
|AllResist
|Approved, not tested yet. Should work similar to ZEP520A. Please contact [mailto:Lithography@danchip.dtu.dk Lithography] for information.
|[[media:CSAR_62_and_process_chemicals.pdf‎|CSAR_62_and_process_chemicals.pdf‎]], [[media:CSAR_62_Abstract_Allresist.pdf‎|CSAR_62_Abstract_Allresist.pdf‎]]
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]]
|X AR 600-54/6, MIBK:IPA
|IPA, H2O
|
|[[media:Process_Flow_CSAR.docx‎|Process_Flow_CSAR.docx‎]]
|-
|-style="background:WhiteSmoke; color:black"
|'''HSQ (XR-1541)'''
|'''HSQ (XR-1541)'''
|Negative
|Negative
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|-
|-
|-style="background:LightGrey; color:black"
|-style="background:WhiteSmoke; color:black"
|'''ma-N 2403'''
|'''ma-N 2403'''
|Negative
|Negative
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|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:LightGrey; color:black"
|'''AR-N 7520'''
|'''AR-N 7520'''
|Negative
|Negative
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