Specific Process Knowledge/Thin film deposition/Deposition of Silicon: Difference between revisions
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* 4x 2" wafers | * 4x 2" wafers | ||
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*1- | *1-30 wafers (4" furnace) | ||
* | *1-25 wafes (6" furnace) | ||
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*24x 2" wafers or | *24x 2" wafers or | ||
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* Quartz wafers | * Quartz wafers | ||
* Pyrex wafers | * Pyrex wafers | ||
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* Silicon wafers (new or RCA cleaned) | |||
** with layers of silicon oxide or silicon (oxy)nitride | |||
** from the A, B and E stack furnaces | |||
* Quartz/fused silica wafers (RCA cleaned) | |||
| | | | ||
* Silicon wafers | * Silicon wafers | ||