Specific Process Knowledge/Lithography/DUVStepperLithography: Difference between revisions

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	Here you can find a chart demonstrating a dependence between 250nm line width/pillors diameter and exposure dose.		Here you can find a chart demonstrating a dependence between 250nm line width/pillors diameter and exposure dose.
	[[~~Chart~~:~~Canon_Stepper_Reticle_Guide_v0_03~~.pdf]].		[[File:250nm_ines_and_pillars_after_developing_i_60sec.pdf]].