Specific Process Knowledge/Lithography/DUVStepperLithography: Difference between revisions
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==Process information== | ==Process information== | ||
[[Image:140 250 nm tilt22 (1).jpg| | [[Image:140 250 nm tilt22 (1).jpg|400x400px|right|thumb|The SEM picture of 250nm pillors and lines. Exposure dose is 140 J/m2.]] | ||
The users are not allowed to use the developer. In case you would like to do DUV lithography please contact Lithography team, who will consult you and run your wafers for you. | The users are not allowed to use the developer. In case you would like to do DUV lithography please contact Lithography team, who will consult you and run your wafers for you. | ||