Specific Process Knowledge/Lithography/DUVStepperLithography: Difference between revisions
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==Process information== | ==Process information== | ||
The users are not allowed to use the developer. In case you would like to do DUV lithography please contact Lithography team, who will consult you and run your wafers for you. | The users are not allowed to use the developer. In case you would like to do DUV lithography please contact Lithography team, who will consult you and run your wafers for you. | ||
We have observed that using automatic developing we can decrease the exposure dose for resolve the 250nm pillors structures comparing to dose needed for resolve the line the same size. | |||
== Equipment performance and process related parameters == | == Equipment performance and process related parameters == | ||