Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
| Line 90: | Line 90: | ||
|[[media:AZ_nLOF_2020.pdf|AZ_nLOF_2020.pdf]] | |[[media:AZ_nLOF_2020.pdf|AZ_nLOF_2020.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]] | ||
|<30 mJ/cm2 per µm resist for i-line | |<30 mJ/cm2 per µm resist for i-line, decreasing with increasing thickness. | ||
Same dose for broadband exposure. | Same dose for broadband exposure. | ||