Specific Process Knowledge/Lithography/Baking: Difference between revisions
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[[Image:SU-8hotplates.jpg|200x200px|thumb|Hotplate 1 (SU8) and Hotplate 2 (SU8) situated in C-1]] | [[Image:SU-8hotplates.jpg|200x200px|thumb|Hotplate 1 (SU8) and Hotplate 2 (SU8) situated in C-1]] | ||
We have two dedicated SU-8 hotplates in C-1. | We have two dedicated SU-8 hotplates in C-1. | ||
Users can control the ramp-time, the baking temperature, and the baking time. | Users can control the ramp-time, the baking temperature, and the baking time. | ||