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Specific Process Knowledge/Lithography/Baking: Difference between revisions

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==SU8 hotplates==
==SU8 hotplates==
[[Image:su8_bench.jpg|200x200px|thumb|Hotplate 1 (SU8) and Hotplate 2 (SU8) situated in C-1]]
[[Image:SU-8hotplates.jpg|200x200px|thumb|Hotplate 1 (SU8) and Hotplate 2 (SU8) situated in C-1]]
We have two dedicated SU-8 hotplates in C-1.
We have two dedicated SU-8 hotplates in C-1.
Users can control the ramp-time, the baking temperature, and the baking time.
Users can control the ramp-time, the baking temperature, and the baking time.