Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch): Difference between revisions
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*Typical profiles: 86-90 degrees | *Typical profiles: 86-90 degrees | ||
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!style="background:silver; color:black" align="left" valign="top" rowspan=" | !style="background:silver; color:black" align="left" valign="top" rowspan="4"|Process parameter range | ||
|style="background:LightGrey; color:black"|Process pressure | |style="background:LightGrey; color:black"|Process pressure | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*~0.2-95 mTorr | *~0.2-95 mTorr | ||
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|style="background:LightGrey; color:black"|Process power | |||
|style="background:WhiteSmoke; color:black"| | |||
*Coil power: up to 3000W | |||
*Platen power: up to 600W | |||
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|style="background:LightGrey; color:black"|Platen temperature | |||
|style="background:WhiteSmoke; color:black"| | |||
*-10 to 60 degrees Celcius | |||
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|style="background:LightGrey; color:black"|Gas flows | |style="background:LightGrey; color:black"|Gas flows | ||