Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch): Difference between revisions

@@ Line 61: / Line 61: @@
 |style="background:LightGrey; color:black"|Gas flows
 |style="background:WhiteSmoke; color:black"|
-*C<math>_4</math>F<math>_8</math>: 0-40 sccm
+*C<sub>4</sub>F<sub>8</sub>: 0-40 sccm
-*O<math>_2</math>: 0-100 sccm
+*O<sub>2</sub>: 0-100 sccm
-*CF<math>_4</math>: 0-100 sccm
+*CF<sub>4</sub>: 0-100 sccm
-*H<math>_2</math>: 0-30 sccm
+*H<sub>2</sub>: 0-30 sccm
 *He: 0-500 sccm
-*N<math>_2</math>: 0-1000 sccm
+*N<sub>2</sub>: 0-1000 sccm
-*SF<math>_6</math>: 0-300 sccm
+*SF<sub>6</sub>: 0-300 sccm
 |-
 !style="background:silver; color:black" align="left" valign="top" rowspan="3"|Substrates