Specific Process Knowledge/Thin film deposition/Deposition of Silicon: Difference between revisions
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|560 <sup>o</sup>C (amorph) and 620 <sup>o</sup>C (poly) | |560 <sup>o</sup>C (amorph) and 620 <sup>o</sup>C (poly) | ||
|? | |? | ||
| | |Platen: 5-60 <sup>o</sup>C | ||
|? | |? | ||
| Line 82: | Line 82: | ||
|Good | |Good | ||
|. | |. | ||
| | |Not known | ||
|Poor | |Poor | ||
|- | |- | ||
| Line 91: | Line 91: | ||
|Good for fused silica, silicon oxide, silicon nitride, silicon | |Good for fused silica, silicon oxide, silicon nitride, silicon | ||
|. | |. | ||
| | |Not tested | ||
|Bad for pyrex, for other materials we do not know | |Bad for pyrex, for other materials we do not know | ||
|- | |- | ||