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Specific Process Knowledge/Thermal Process/Annealing: Difference between revisions

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==Comparison of the annealing furnaces==
==Comparison of the annealing furnaces==
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!General description
!General description
|Annealing of 6" wafers. Annealing of wafers from the LPCVD furnaces and PECVD1.  
|Annealing of 4" and 6" wafers. Annealing of wafers from the LPCVD furnaces and PECVD2.  
|Annealing of wafers from EVG-NIL, PECVD3 and wafers with aluminum.
|Annealing of wafers from EVG-NIL, PECVD3 and wafers with aluminum.
|Annealing of almost materials on silicon wafer.
|Annealing of almost all materials on silicon wafers.
|Rapid thermal annealing
|Rapid thermal annealing
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!Substrate and Batch size  
!Substrate and Batch size  
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*Small samples on a carrier wafer, horizontal
*1-30 50 mm wafers
*1-30 50 mm wafers
*1-30 100 mm wafers
*1-30 100 mm wafers
*1-30 150 mm wafers
*1-30 150 mm wafers
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*Small samples on carrier wafer, horizontal
*Small samples on a carrier wafer, horizontal
*1-30 50 mm wafers
*1-30 50 mm wafers
*1-30 100 mm wafers
*1-30 100 mm wafers
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*Small samples on carrier wafer, horizontal
*Small samples on a carrier wafer, horizontal
*1-25 50 mm wafers
*1-25 50 mm wafers
*1-25 100 mm wafers, vertical and horizontal
*1-25 100 mm wafers, vertical and horizontal
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*Small samples on carrier wafer
*Small samples on a carrier wafer, horizontal
*One 100 mm wafers on carrier wafer
*One 100 mm wafers on a carrier wafer
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!'''Allowed materials'''
!'''Allowed materials'''
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*All processed wafers have to be RCA cleaned.
*All processed wafers have to be RCA cleaned, except wafers from LPCVD furnaces and PECVD1.  
*Except for wafers from LPCVD furnaces and PECVD1.  
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*All processed wafers have to be RCA cleaned.
*All processed wafers have to be RCA cleaned, except wafers from EVG-NIL, PECVD3 and wafers for annealing of aluminum.
*Except for wafers from EVG-NIL, PECVD3 and wafer for annealing of aluminum.
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*Almost all materials, permission is need.  
*Almost all materials, permission is needed.  
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*III-V samples
*III-V samples
*Silicon wafer
*Silicon wafers
*Some metals
*Some metals