Specific Process Knowledge/Lithography/Coaters: Difference between revisions
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'''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_labspin click here]''' | '''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_labspin click here]''' | ||
The Spin coater: Manual labspin is a SÜSS RCD8 Spin Coater intended for processing... | The Spin coater: Manual labspin is a SÜSS RCD8 Spin Coater intended for processing... of III-V compound semiconductors and CMOS compatible materals. Please note, that '''there are different chucks for III-V materials and Si-, SiO2-materials.''' The spinner is mounted in a flow hood located in the III-V laboratory (yellow room). The extra exhaust should always be turned on while spinning. | ||
'''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=331 LabManager]''' | '''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=331 LabManager]''' | ||