Specific Process Knowledge/Thin film deposition/Deposition of Silicon: Difference between revisions
No edit summary |
No edit summary |
||
| Line 111: | Line 111: | ||
! Allowed material | ! Allowed material | ||
| | | | ||
* Silicon oxide | |||
* Silicon (oxy)nitride | |||
* Photoresist | |||
* PMMA | |||
* Mylar | |||
* SU-8 | |||
* Any metals | |||
| | | | ||
| | | | ||