Specific Process Knowledge/Thin film deposition/Deposition of Palladium: Difference between revisions

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! Layer thickness
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|10Å to 1µm  
|10Å to 1µm*
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'''*''' ''For thicknesses above 200 nm permission is requested.''

Revision as of 12:38, 10 March 2014

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Palladium can be deposited by e-beam evaporation. In the chart below you can compare the different deposition equipment.


E-beam evaporation (Alcatel)
Batch size
  • Up to 1x4" wafers
  • smaller pieces
Pre-clean RF Ar clean
Layer thickness 10Å to 1µm*
Deposition rate 2Å/s to 10Å/s
Allowed materials
  • Silicon oxide
  • Silicon (oxy)nitride
  • Photoresist
  • PMMA
  • Mylar
  • SU-8
  • Metals
Comment

* For thicknesses above 200 nm permission is requested.

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