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Specific Process Knowledge/Thermal Process/Oxidation: Difference between revisions

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!'''Allowed materials'''
!'''Allowed materials'''
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*Allowed material 1
*All wafers have to be RCA cleaned.
*Allowed material 2
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*Allowed material 1
*All wafers have to be RCA cleaned.
*Allowed material 2
*Allowed material 3
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*All wafers have to be RCA cleaned.
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Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thermal_Process/Oxidation"