Specific Process Knowledge/Thermal Process/Oxidation: Difference between revisions

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 !Substrate and Batch size
 |
-Up to 30 wafers
+*1-30 50 mm wafers
-*<nowiki>#</nowiki> 50 mm wafers
+*1-30 100 mm wafers
-*<nowiki>#</nowiki> 100 mm wafers
+Including one test wafer
 |
-Up to 30 wafers
+*1-30 50 mm wafers
-*<nowiki>#</nowiki> 50 mm wafers
+*1-30 100 mm wafers
-*<nowiki>#</nowiki> 100 mm wafers
+Including one test wafer
 |
-Up to 30 wafers
+*1-30 50 mm wafers
-*<nowiki>#</nowiki> 50 mm wafers
+*1-30 100 mm wafers
-*<nowiki>#</nowiki> 100 mm wafers
+Including one test wafer
 |
-Up to 30 wafers
+*1-30 50 mm wafers
-*<nowiki>#</nowiki> 50 mm wafers
+*1-30 100 mm wafers
-*<nowiki>#</nowiki> 100 mm wafers
+*1-30 150 mm wafers
-*<nowiki>#</nowiki> 150 mm wafers
+Including one test wafer
 |
-Up to 30 wafers
+*Small samples on carrier wafer, horizontal
-*<nowiki>#</nowiki> 50 mm wafers
+*1-30 50 mm wafers
-*<nowiki>#</nowiki> 100 mm wafers
+*1-30 100 mm wafers
+Including one test wafer
 |
-Up to 150 wafers
+*1-150 100 mm wafers
-*<nowiki>#</nowiki> 100 mm wafers
 |
-Up to 20 wafers both vertical and horizontal
+*Small samples on carrier wafer, horizontal
-*<nowiki>#</nowiki> Small samples
+*1-25 50 mm wafers
-*<nowiki>#</nowiki> 50 mm wafers
+*1-25 100 mm wafers, vertical and horizontal
-*<nowiki>#</nowiki> 100 mm wafers
 |-