Specific Process Knowledge/Thin film deposition/Deposition of Nickel: Difference between revisions
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*Thicknesses above 2000 Å requires special permission | *Thicknesses above 2000 Å requires special permission | ||
|Only very thin layers (up to 100nm). | |Only very thin layers (up to 100nm). | ||
|Sample must be compatible with plating bath. Seed metal necessary. | |Sample must be compatible with plating bath. Seed metal necessary. Never use gold directly on silicon. | ||
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