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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide: Difference between revisions

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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,318 edits
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!Parameter 2
!Film thickness
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*A
*~300nm - 4µm
*B
*C
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*A
*~40nm - 30µm
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*Thin layers (up to 300-400 nm)
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*~10nm - ~1µm(>2h)
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