Specific Process Knowledge/Thin film deposition/Deposition of Chromium: Difference between revisions
Appearance
No edit summary |
No edit summary |
||
| Line 41: | Line 41: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
! Layer thickness | ! Layer thickness | ||
|10Å to 1µm | |10Å to 1µm* | ||
|10Å to 1µm | |10Å to 1µm* | ||
|10Å to 1000 Å | |10Å to 1000 Å | ||
|. | |. | ||
| Line 63: | Line 63: | ||
|- | |- | ||
|} | |} | ||
'''*''' ''For thicknesses above 200 nm permission from ThinFilm group is required.'' | |||
== Studies of Cr deposition processes == | == Studies of Cr deposition processes == | ||