Specific Process Knowledge/Thin film deposition/Deposition of Titanium: Difference between revisions
Appearance
No edit summary |
No edit summary |
||
| Line 43: | Line 43: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
! Layer thickness | ! Layer thickness | ||
|10Å to 1µm | |10Å to 1µm* | ||
|10Å to 1 µm | |10Å to 1 µm* | ||
|10Å to 1000Å | |10Å to 1000Å | ||
|. | |. | ||
| Line 123: | Line 123: | ||
|} | |} | ||
'''*''' ''For thicknesses above 200 nm permission from ThinFilm group (thinfilm@danchip.dtu.dk) is required.'' | |||
== Comments: Choise of equipment == | == Comments: Choise of equipment == | ||