Jump to content

Specific Process Knowledge/Thin film deposition/Deposition of Gold: Difference between revisions

Knil (talk | contribs)
No edit summary
Knil (talk | contribs)
No edit summary
Line 53: Line 53:
|Not measured
|Not measured
|Not measured
|Not measured
|-style="background:WhiteSmoke; color:black"
| Comment
|For thicknesses above 200 nm
permission is required
|For thicknesses above 200 nm
permission is required
|
|Used to gold sputter coating of 
samples mainly before SEM characterization
|Used to gold sputter coating of
samples mainly before SEM characterization
|-
|-
|}
|}
'''*'''  ''For thicknesses above 200 nm permission from ThinFilm group (thinfilm@danchip.dtu.dk) is required.''
'''*'''  ''For thicknesses above 200 nm permission from ThinFilm group (thinfilm@danchip.dtu.dk) is required.''