Specific Process Knowledge/Thin film deposition/Deposition of Aluminium: Difference between revisions
Appearance
| Line 63: | Line 63: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
! Layer thickness | ! Layer thickness | ||
|10Å to 1µm | |10Å to 1µm* | ||
|10Å to 1 µm | |10Å to 1 µm* | ||
|10Å to 1000 Å | |10Å to 1000 Å | ||
|10Å to about 2000 Å | |10Å to about 2000 Å | ||
| Line 181: | Line 182: | ||
|} | |} | ||
'''*''' ''For thicknesses above 200 nm permission from ThinFilm group (thinfilm@danchip.dtu.dk) is required.'' | |||
==Aluminium deposition on ZEP520A for lift-off== | ==Aluminium deposition on ZEP520A for lift-off== | ||