Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions
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|80 <sup>o</sup>C | |80 <sup>o</sup>C | ||
|80 <sup>o</sup>C | |80 <sup>o</sup>C | ||
|~70 <sup>o</sup>C the chemicals will heat up to working temperature during mixing, '''therefore be careful!''' First ad H<sub>2</sub>SO<sub>4</sub> then H<sub>2</sub>O<sub>2</sub><sup>{{ | |~70 <sup>o</sup>C the chemicals will heat up to working temperature during mixing, '''therefore be careful!''' First ad H<sub>2</sub>SO<sub>4</sub> then H<sub>2</sub>O<sub>2</sub><sup>{{fn|1}}</sup>. | ||
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