Specific Process Knowledge/Wafer cleaning: Difference between revisions
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*Silicon Oxynitride | *Silicon Oxynitride | ||
*Quartz/fused silica | *Quartz/fused silica | ||
*Pyrex and wafers with Cr ONLY in Mask cleaning bath or beaker | *Pyrex, other glass and Silicon wafers with Cr ONLY allowed in 7-up (Mask) cleaning bath or beaker in fumehood | ||
| | | | ||
*Silicon | *Silicon | ||