Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions
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==Cleaning of wafers or masks== | ==Cleaning of wafers or masks== | ||
Cleaning of wafers or masks with sulphuric acid can be done either in a dedicated tank "7-up" or in the fume hood in a beaker "Piranha" | Cleaning of wafers or masks with sulphuric acid can be done either in a dedicated tank "7-up" or in the fume hood in a beaker "Piranha". | ||
Both 7-up and Piranha removes heavy organics. | Both 7-up and Piranha removes heavy organics. | ||
Always use one of these after KOH etch or hot phosphoric acid etch to remove alkali ions before further processing. 7-up and Piranha are also used as cleaning solutions '''after''' stripping resist. | Always use one of these after KOH etch or hot phosphoric acid etch to remove alkali ions before further processing. 7-up and Piranha are also used as cleaning solutions '''after''' stripping resist. | ||