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Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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|-style="background:silver; color:black"
|-style="background:silver; color:black"
!  
!  
! "7-up"
! 7-up wafers
! 7-up Masks
! Piranha
! Piranha
|-  
|-  
Line 22: Line 23:
|'''General description'''
|'''General description'''
|
|
Cleaning of wafers or masks using the dedicated tanks. There are one tank for masks and glass wafers and one for 4-6" Si wafers in cleanroom D3 and one tank in cleanroom C1 for 4" Si wafers only.
Cleaning of wafers using the dedicated tank in cleanroom D3.  
|
|
Cleaning of wafers using a beaker in the fumehood in cleanroom B1. Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the 7-up for wafers.
Cleaning of masks using the dedicated tank in cleanroom D3.
|
Cleaning of wafers using a beaker in the fumehood in cleanroom B1. Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the 7-up for wafers or masks.
|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
|'''Chemical solution'''
|'''Chemical solution'''
|98% Sulfuric acid and Ammonium sulfate
|98% Sulfuric acid and Ammonium sulfate
|98% Sulfuric acid and Ammonium sulfate
|98% Sulfuric acid and Hydrogen peroxide 4:1 add H<sub>2</sub>O<sub>2</sub> to H<sub>2</sub>SO<sub>4</sub>
|98% Sulfuric acid and Hydrogen peroxide 4:1 add H<sub>2</sub>O<sub>2</sub> to H<sub>2</sub>SO<sub>4</sub>
Line 34: Line 38:
|'''Process temperature'''
|'''Process temperature'''
|80 <sup>o</sup>C
|80 <sup>o</sup>C
 
|80 <sup>o</sup>C
|~70 <sup>o</sup>C the chemicals will heat up to working temperature during mixing, '''therefore be careful!'''First ad H2SO4 then H2O2
|~70 <sup>o</sup>C the chemicals will heat up to working temperature during mixing, '''therefore be careful!'''First ad H2SO4 then H2O2
|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
|'''Process time'''
|'''Process time'''
|
|10 min.
10 min.
|10 min.
|
|10 min.
10 min.
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|'''Allowed materials'''
|'''Allowed materials'''
|
|
Dependent on which bath is used, look at the text in the pictures.
*Silicon
*Poly Silicon
*Silicon Oxide
*Silicon Nitride
*Silicon Oxynitride
*Quartz/fused silica
|
*Silicon
*Poly Silicon
*Silicon Oxide
*Silicon Nitride
*Silicon Oxynitride
*Quartz/fused silica
*Pyrex
*Soda lime glass
*Wafers with Cr
|
|
All materials (in beaker).
All materials (in beaker).
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