Jump to content

Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions

Kabi (talk | contribs)
No edit summary
Kabi (talk | contribs)
No edit summary
Line 27: Line 27:
|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
|
|'''Chemical solution'''
|'''Chemical solution'''
|98% Sulfuric acid and Ammonium sulfate
|98% Sulfuric acid and Ammonium sulfate
Line 33: Line 32:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|
|'''Process temperature'''
|'''Process temperature'''
|80 <sup>o</sup>C
|80 <sup>o</sup>C
Line 40: Line 38:
|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
|
|'''Process time'''
|'''Process time'''
|
|
Line 48: Line 45:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|
|'''Allowed materials'''
|'''Allowed materials'''
|
|
Line 56: Line 52:
|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
|
|'''Batch size'''
|'''Batch size'''
|
|
Line 64: Line 59:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|
|'''Size of substrate'''
|'''Size of substrate'''
|
|