Specific Process Knowledge/Wafer cleaning/IMEC: Difference between revisions
No edit summary |
|||
| Line 28: | Line 28: | ||
Time: 5 min | Time: 5 min | ||
(a yellow and a black spot) | (a yellow and a black spot) | ||
|Clean tank (cleanroom | |Clean tank (cleanroom B1, 7-up bath for wafers) and make your own or make in dedicated glass. | ||
Pour up H<sub>2</sub>SO<sub>4</sub> first, put wafers in carrier (USE this in steps 2-7), add H<sub>2</sub>O<sub>2</sub>, wait 30 sec, dip wafers. | Pour up H<sub>2</sub>SO<sub>4</sub> first, put wafers in carrier (USE this in steps 2-7), add H<sub>2</sub>O<sub>2</sub>, wait 30 sec, dip wafers. | ||
|Maybe clean the tank the day before! | |Maybe clean the tank the day before! | ||
| Line 44: | Line 44: | ||
Time: 100 sec | Time: 100 sec | ||
(two black spots) | (two black spots) | ||
|Clean tank (cleanroom | |Clean tank (cleanroom D3, tank for buffer with wetting solution) and make your own. Mix in dedicated bottle (IMEC) in fume hood and add to tank using BHF pump from RCA fumehood! | ||
| | | | ||
. | . | ||