Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions
| Line 20: | Line 20: | ||
|'''General description''' | |'''General description''' | ||
| | | | ||
Cleaning of wafers or masks using the dedicated tanks. There are one tank for masks and glass wafers and one for 4-6" Si wafers in cleanroom | Cleaning of wafers or masks using the dedicated tanks. There are one tank for masks and glass wafers and one for 4-6" Si wafers in cleanroom D3 and one tank in cleanroom C1 for 4" Si wafers only. | ||
| | | | ||
Cleaning of wafers using a beaker in the fumehood in cleanroom | Cleaning of wafers using a beaker in the fumehood in cleanroom B1. Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the 7-up for wafers. | ||
|- | |- | ||
|'''Chemical solution''' | |'''Chemical solution''' | ||