Specific Process Knowledge/Characterization/Four-Point Probe: Difference between revisions

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The wafer are pushed down on the four pins so a measurement is performed. It works only for 4" wafers because a special holder is need.  
The wafer are pushed down on the four pins so a measurement is performed. It works only for 4" wafers because a special holder is need.  
[[Image:4pointprobe.jpg|thumb|300x300px|Four point probe: positioned in cleanroom 4]]
[[Image:4pointprobe.jpg|thumb|300x300px|Four point probe: positioned in cleanroom D-3]]


'''The user manual, technical information and contact information can be found in LabManager:'''
'''The user manual, technical information and contact information can be found in LabManager:'''

Revision as of 11:37, 28 February 2014

Four-Point Probe

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The Four-Point Probe is a Veeco FPP-5000 for I/V measurement. The main purpose is to measure resistance and resistivity on a 4" silicon wafer. But can also be used to find thickness of thin layers or test if is a N- or P-type wafer.

The wafer are pushed down on the four pins so a measurement is performed. It works only for 4" wafers because a special holder is need.

Four point probe: positioned in cleanroom D-3

The user manual, technical information and contact information can be found in LabManager:

Four point probe

Overview of the performance of the Four-Point Probe and some process related parameters

Purpose Resistance and resistivity measurement
Process parameter range Process Temperature
  • Room temperature
Process pressure
  • 1 atm
Substrates Batch size
  • 1 4" wafer per measurement
Substrate material allowed
  • Silicon wafers