Specific Process Knowledge/Thermal Process/A1 Bor Drive-in furnace: Difference between revisions
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For the pre-deposition process boron source wafers are used as the doping source to dope Si wafers with boron to make conductive structures, etch stop layers etc. There are only a few source wafers, i.e. it is not possible to make an entire batch of 30 wafers, but both sides of the doping source wafers are available for pre-deposition. It is necessary to activate the source wafers before use by heating them for 1 hour at the temperature needed during the pre-deposition (but not lover than 1050 degrees Celsius). During the pre-deposition a boron phase layer is created on the device wafers. This layer can be removed in HF if the wafers are oxidised in the furnace after the pre-deposition. | For the pre-deposition process boron source wafers are used as the doping source to dope Si wafers with boron to make conductive structures, etch stop layers etc. There are only a few source wafers, i.e. it is not possible to make an entire batch of 30 wafers, but both sides of the doping source wafers are available for pre-deposition. It is necessary to activate the source wafers before use by heating them for 1 hour at the temperature needed during the pre-deposition (but not lover than 1050 degrees Celsius). During the pre-deposition a boron phase layer is created on the device wafers. This layer can be removed in HF if the wafers are oxidised in the furnace after the pre-deposition. | ||
The Boron Drive-in + Pre-dep furnace is the top furnace tube in the A-stack positioned in cleanroom | The Boron Drive-in + Pre-dep furnace is the top furnace tube in the A-stack positioned in cleanroom B-1. The furnaces in the A-stack are the cleanest of all furnaces in the cleanroom. Please be aware of that all wafers have to be RCA cleaned before they enter the furnace, and check the cross contamination information in LabManager before you use the furnace. | ||
'''The user manual, quality control instruction and results, technical information and contact information can be found in LabManager:''' | '''The user manual, quality control instruction and results, technical information and contact information can be found in LabManager:''' | ||