Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|''' | |'''AZ 5214E''' | ||
|Positive but can be | |Positive but can be reversed | ||
|[http://www.azem.com/en/Products/Litho-technology/Photoresists.aspx AZ Electronic Materials] | |[http://www.azem.com/en/Products/Litho-technology/Photoresists.aspx AZ Electronic Materials] | ||
|Can be used for both positive and reverse processes with resist thickness between 1 to 4um. | |Can be used for both positive and reverse processes with resist thickness between 1 to 4um. | ||
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|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
|''' | |'''A 4562''' | ||
|Positive | |Positive | ||
|[http://www.azem.com/en/Products/Litho-technology/Photoresists.aspx AZ Electronic Materials] | |[http://www.azem.com/en/Products/Litho-technology/Photoresists.aspx AZ Electronic Materials] | ||
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|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
|''' | |'''SU-8''' | ||
|Negative | |Negative | ||
|[http://microchem.com/Prod-SU82000.htm Microchem] | |[http://microchem.com/Prod-SU82000.htm Microchem] | ||
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|[[media:SU-8_DataSheet_2005.pdf|SU-8_DataSheet_2005.pdf]], [[media:SU-8_DataSheet_2075.pdf|SU-8_DataSheet_2075.pdf]] | |[[media:SU-8_DataSheet_2005.pdf|SU-8_DataSheet_2005.pdf]], [[media:SU-8_DataSheet_2075.pdf|SU-8_DataSheet_2075.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#KS Spinner|KS Spinner]] | |[[Specific_Process_Knowledge/Lithography/Coaters#KS Spinner|KS Spinner]] | ||
|PGMEA, | |PGMEA, mr-Dev 600 developer | ||
|IPA | |IPA | ||
|Plasma ashing can remove crosslinked SU8. | |Plasma ashing can remove crosslinked SU8. | ||