Specific Process Knowledge/Etch/KOH Etch: Difference between revisions
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<gallery caption="Different places to do anisotropic wet silicon etch" widths="250px" heights="150px" perrow="3"> | <gallery caption="Different places to do anisotropic wet silicon etch" widths="250px" heights="150px" perrow="3"> | ||
image:KOH3_RR4_1.JPG|KOH3 bench for etch of 4" and 6" wafers. Positioned in cleanroom | image:KOH3_RR4_1.JPG|KOH3 bench for etch of 4" and 6" wafers. Positioned in cleanroom D-3. | ||
image:KOH_4tommer.jpg|KOH etch for 4" wafers. KOH1 to the left and KOH2 to the right, in between you find the BHF tank. Positioned in cleanroom | image:KOH_4tommer.jpg|KOH etch for 4" wafers. KOH1 to the left and KOH2 to the right, in between you find the BHF tank. Positioned in cleanroom C-1. | ||
image:KOH_fumehood.JPG|KOH_fumehood is positioned in cleanroom | image:KOH_fumehood.JPG|KOH_fumehood is positioned in cleanroom A-1. This is used for wafers that are considered dirty.</gallery> | ||
'''The user manuals, quality control procedures and results, user APVs, technical information and contact information can be found in LabManager:''' | '''The user manuals, quality control procedures and results, user APVs, technical information and contact information can be found in LabManager:''' | ||