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Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions

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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,315 edits
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|SEM profile images
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<gallery caption="Some chemicals of the MVD and the surface reaction" widths="200px" heights="150px" perrow="3">  
<gallery widths="200px" heights="150px" perrow="3">  
image:ICP_metal_resist_no_etch_s4075_2.jpg|Resist profile before etch
image:ICP_metal_resist_no_etch_s4075_2.jpg|Resist profile before etch
image:ICP_metal_slow_s4075_sio2_4.jpg|Resist profiler after etch 01-02-2014.
image:ICP_metal_slow_s4075_sio2_4.jpg|Resist profiler after etch 01-02-2014.
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