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Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions

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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,318 edits
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,318 edits
Line 30: Line 30:
{| border="2" cellspacing="2" cellpadding="3"
{| border="2" cellspacing="2" cellpadding="3"
!Results  
!Results  
!Test on maskless wafer
!Test on wafer with 50% load (Travka 50), by BGHE @danchip
|-
|-
|Etch rate of thermal oxide
|Etch rate of thermal oxide
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