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Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions

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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,318 edits
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|Take a look at the images but be aware that the resist profile was not good to begin with.
|Take a look at the images but be aware that the resist profile was not good to begin with.
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|-
|Images (click on the image to view a larger image)
|Wafer uniformity map (click on the image to view a larger image)
|[[image:ICP_metal_slow_wafer_uniformity_s4075.jpg|275x275px|right|thumb|Contour plot of the etch rate over the wafer, 9 points measured]]  
|[[image:ICP_metal_slow_wafer_uniformity_s4075.jpg|275x275px|center|thumb|Contour plot of the etch rate over the wafer, 9 points measured]]  
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|-
|SEM profile images
|SEM profile images
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