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Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions

Taran (talk | contribs)
Taran (talk | contribs)
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!Etch rate range
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*~75 nm/min (Thermal oxide) in BHF
*~90 nm/min (Thermal oxide) in SIO Etch
*~25 nm/min (Thermal oxide) in 5%HF
*~3-4µm/min in 40%HF
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*Process dependent
*Tested range: ~20nm/min - ~120nm/min
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*Process dependent
*Tested range: ~230nm/min - ~550nm/min
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