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Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,527 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,527 edits
Line 36: Line 36:
hexamethyldisilazane (HMDS)
hexamethyldisilazane (HMDS)
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Buffered HF
12%HF with Ammoniumflouride
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none
none
Line 76: Line 76:
hmds
hmds
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bhf
*Silicon
*Poly Silicon
*Silicon Oxide
*Silicon Nitride
*Silicon Oxynitride
*Photoresist
*Blue film
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250c
*Silicon
*Silicon Oxide
*Silicon Nitride
*Glass
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