Specific Process Knowledge/Etch/ASE (Advanced Silicon Etch): Difference between revisions
Appearance
| Line 48: | Line 48: | ||
*O<sub>2</sub>: 0-100 sccm | *O<sub>2</sub>: 0-100 sccm | ||
*C<sub>4</sub>F<sub>8</sub>: 0-300 sccm | *C<sub>4</sub>F<sub>8</sub>: 0-300 sccm | ||
*CO<sub>2</sub>: 0-100 sccm | |||
*Ar: 0-100 sccm | *Ar: 0-100 sccm | ||
|- | |- | ||