Jump to content

Specific Process Knowledge/Etch/ASE (Advanced Silicon Etch): Difference between revisions

Bghe (talk | contribs)
Jmli (talk | contribs)
Line 48: Line 48:
*O<sub>2</sub>: 0-100 sccm
*O<sub>2</sub>: 0-100 sccm
*C<sub>4</sub>F<sub>8</sub>: 0-300 sccm
*C<sub>4</sub>F<sub>8</sub>: 0-300 sccm
*CO<sub>2</sub>: 0-100 sccm
*Ar: 0-100 sccm
*Ar: 0-100 sccm
|-
|-